Zinc Sputtering Target 99.99% Zn PVD
High-Purity PVD Zinc Sputtering Target
Description
Description
Zinc Sputtering Target — 99.99% (4N) PVD Grade
High-purity zinc (Zn) sputtering target for reactive sputtering of ZnO and AZO (Al-doped ZnO) transparent conducting oxide films, anti-corrosion coating research, and zinc-based piezoelectric thin-film development. ZnO and AZO are leading transparent conductor alternatives to ITO in next-generation solar cells.
Key Specifications
- Purity: 99.99% Zn (4N)
- Geometry: Disc or rectangular
- Standard sizes: 2″–6″ diameter, 3–9 mm thick
- Backing plate: Optional Cu backing
Applications
- Reactive sputtering of ZnO transparent films
- AZO (ZnO:Al) transparent conducting oxide
- Zinc anti-corrosion coating research
- ZnO piezoelectric film for MEMS research
Available in bonded and unbonded configurations. Specify size, thickness, and bonding requirement for quotation.
