Iron-Nickel Fe-Ni Sputtering Target Magnetic Film
Soft Magnetic Fe-Ni Thin-Film Target
Description
Description
Iron-Nickel (Fe-Ni) Sputtering Target — Magnetic Thin-Film Research
High-purity iron-nickel alloy (Fe-Ni) sputtering target for deposition of permalloy (Ni₈₀Fe₂₀) and related soft magnetic thin films used in spintronics, MRAM, magnetic sensor, and magnetoresistance research. The composition is critical — slight deviation from Ni₈₀Fe₂₀ significantly affects magnetic properties.
Key Specifications
- Standard compositions: Ni₈₀Fe₂₀ (permalloy), Ni₄₅Fe₅₅ (equiatomic), custom ratios
- Purity: ≥99.95% total (Fe+Ni)
- Grain size: <150 µm
- Geometry: Disc 2″–4″ or rectangular
- Backing: Cu or Mo backing plate available
Applications
- Permalloy (Ni₈₀Fe₂₀) thin-film research
- MRAM free-layer deposition
- GMR/TMR magnetic sensor fabrication
- Soft magnetic core research
Specify Fe:Ni ratio, target diameter, thickness, and backing plate for a formal quotation. Custom compositions available with minimum order.
