Molybdenum Sputtering Target 99.95% Mo PVD
Refractory Molybdenum PVD Sputtering Target
Description
Description
Molybdenum Sputtering Target — 99.95% (3N5) PVD Grade
High-purity molybdenum (99.95%) sputtering target for CIGS/CIS solar cell back-contact deposition, flat panel display electrode layers, X-ray targets, and refractory metal thin-film research. Molybdenum is the standard back-contact material in CIGS and CdTe thin-film solar cells.
Key Specifications
- Purity: 99.95% Mo (3N5)
- Relative density: ≥97%
- Grain size: <150 µm
- Geometry: Disc or rectangular, standard 2″–8″ diameter
- Thickness: 3–9 mm
Applications
- CIGS/CIS thin-film solar cell Mo back-contact
- TFT-LCD gate and source electrode
- Diffusion barrier layer in microelectronics
- High-temperature refractory coating research
Specify diameter, thickness, and backing plate. Certificate of analysis with XRF analysis provided.
