Silicon Sputtering Target — 5N/6N (99.999%/99.9999%) Optical Grade
Ultra-high purity silicon sputtering targets (5N and 6N grades) for optical anti-reflection coatings, SiO₂ and Si₃N₄ reactive sputtering, photovoltaic passivation layer research, and semiconductor thin-film applications. The 6N (99.9999%) grade is required for advanced optoelectronic and quantum device research.
Key Specifications
- Purity: 99.999% (5N) or 99.9999% (6N)
- Type: N-type (phosphorus doped) or P-type (boron doped) or undoped
- Resistivity: 1–100 Ω·cm (or <0.01 Ω·cm for conductive grade)
- Geometry: Disc 2″–6″ or rectangular
- Thickness: 3–9 mm
Applications
- SiO₂ and Si₃N₄ reactive sputtering (optical coatings)
- Solar cell anti-reflection coating
- Passivation layer for semiconductor devices
- Optical waveguide research
Specify purity grade, doping type, geometry, and thickness for a formal quotation.
