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Sputtering Targets and Substrates

Molybdenum Sputtering Target 99.95% Mo PVD

Refractory Molybdenum PVD Sputtering Target

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Molybdenum Sputtering Target — 99.95% (3N5) PVD Grade

High-purity molybdenum (99.95%) sputtering target for CIGS/CIS solar cell back-contact deposition, flat panel display electrode layers, X-ray targets, and refractory metal thin-film research. Molybdenum is the standard back-contact material in CIGS and CdTe thin-film solar cells.

Key Specifications

  • Purity: 99.95% Mo (3N5)
  • Relative density: ≥97%
  • Grain size: <150 µm
  • Geometry: Disc or rectangular, standard 2″–8″ diameter
  • Thickness: 3–9 mm

Applications

  • CIGS/CIS thin-film solar cell Mo back-contact
  • TFT-LCD gate and source electrode
  • Diffusion barrier layer in microelectronics
  • High-temperature refractory coating research

Specify diameter, thickness, and backing plate. Certificate of analysis with XRF analysis provided.

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Molybdenum Sputtering Target 99.95% Mo PVD

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