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Sputtering Targets and Substrates

Iron-Nickel Fe-Ni Sputtering Target Magnetic Film

Soft Magnetic Fe-Ni Thin-Film Target

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Iron-Nickel (Fe-Ni) Sputtering Target — Magnetic Thin-Film Research

High-purity iron-nickel alloy (Fe-Ni) sputtering target for deposition of permalloy (Ni₈₀Fe₂₀) and related soft magnetic thin films used in spintronics, MRAM, magnetic sensor, and magnetoresistance research. The composition is critical — slight deviation from Ni₈₀Fe₂₀ significantly affects magnetic properties.

Key Specifications

  • Standard compositions: Ni₈₀Fe₂₀ (permalloy), Ni₄₅Fe₅₅ (equiatomic), custom ratios
  • Purity: ≥99.95% total (Fe+Ni)
  • Grain size: <150 µm
  • Geometry: Disc 2″–4″ or rectangular
  • Backing: Cu or Mo backing plate available

Applications

  • Permalloy (Ni₈₀Fe₂₀) thin-film research
  • MRAM free-layer deposition
  • GMR/TMR magnetic sensor fabrication
  • Soft magnetic core research

Specify Fe:Ni ratio, target diameter, thickness, and backing plate for a formal quotation. Custom compositions available with minimum order.

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Iron-Nickel Fe-Ni Sputtering Target Magnetic Film

Quotation within 1 working day

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